Lv6
2060 积分 2022-07-06 加入
Low temperature atomic layer deposition of PbO2 for electrochemical applications
8个月前
已关闭
Low temperature atomic layer deposition of PbO2 for electrochemical applications
8个月前
已关闭
Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant
8个月前
已完结
A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics
8个月前
已完结
Advances in Atomic Layer Deposition of Metal Sulfides: From a Precursors Perspective
9个月前
已完结