Lv6
2100 积分 2022-07-06 加入
Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor
3个月前
已完结
Low temperature atomic layer deposition of PbO2 for electrochemical applications
11个月前
已关闭
Low temperature atomic layer deposition of PbO2 for electrochemical applications
11个月前
已关闭
Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant
1年前
已完结
A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics
1年前
已完结
Advances in Atomic Layer Deposition of Metal Sulfides: From a Precursors Perspective
1年前
已完结
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