Sintering densification behavior of nano-ITO powder with high oxygen vacancy induced via plasma stimulation

With the growing electronics display industry, indium tin oxide (ITO) powder plays a crucial role in target preparation. To enhance the sintering performance of ITO powder, a high-activity nano ITO powder was prepared using plasma spraying, and compared to a commercial powder. This study aimed to investigate the effects of different preparation methods on powder morphology, dispersibility, oxygen vacancy concentration, and the physical properties of powders on target density, surface morphology, grain size, element distribution, and solid solubility. The results indicate that the plasma spraying high-activity nano ITO powder exhibits better dispersibility, higher oxygen vacancy concentration, and a specific surface area of up to 88.39m2/g compared to the commercial powder. Under normal pressure sintering conditions, plasma spraying nanoscale ITO powder exhibits higher sintering activity, leading to easier densification of ceramic targets with reduced porosity, more uniform surface grains, and significant stepped growth between surface grains. High-resolution transmission electron microscopy (HRTEM) analysis suggests that targets prepared with high-activity powder have greater tin solubility in indium oxide compared to traditional commercial ceramic targets. This article further explores the relationship between powder specific surface area, oxygen vacancy, and sintering activity, along with the formation mechanism of high oxygen vacancy.