晶片切割
模具准备
模具(集成电路)
晶片键合
薄脆饼
过程(计算)
等离子体
材料科学
光电子学
计算机科学
制造工程
机械工程
工程物理
工程类
物理
操作系统
量子力学
作者
Samuel Suhard,Koen Kennes,Pieter Bex,Violeta Georgieva,Filip Schleicher,Edward Walsby,Richard Barnett,Anne Jourdain,Gerald Beyer,Eric Beyne
标识
DOI:10.1109/eptc59621.2023.10457656
摘要
In this paper, the integration of plasma dicing within the collective die to wafer hybrid bonding process flow will be discussed. A layer to protect Cu pads on the die bonding interface has been explored. The resulting dies were bonded to the target wafer and were measured electrically on Kelvin and daisy chains structure on pitch ranging from 5 to 20 μm.
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