氧化铟锡
工作职能
表面改性
X射线光电子能谱
接触角
铟
化学
开尔文探针力显微镜
氧化物
衰减全反射
吸收(声学)
锡
红外光谱学
化学工程
分析化学(期刊)
无机化学
材料科学
纳米技术
有机化学
物理化学
图层(电子)
复合材料
原子力显微镜
工程类
作者
Sharon E Koh,Krystal D McDonald,David H. Holt,C. S. Dulcey,John A. Chaney,Pehr E. Pehrsson
出处
期刊:Langmuir
[American Chemical Society]
日期:2006-06-06
卷期号:22 (14): 6249-6255
被引量:85
摘要
The work function of indium tin oxide (ITO) substrates was modified with phosphonic acid molecular films. The ITO surfaces were treated prior to functionalization with a base cleaning procedure. The film growth and coverage were quantified by contact angle goniometry and XPS. Film orientation was determined by reflection/absorption infrared spectroscopy using ITO-on-Cr substrates. The absolute work functions of nitrophenyl- and cyanophenyl-phosphonic acid films in ITO were determined by Kelvin probe measurement to be 5.60 and 5.77 eV, respectively.
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