镍
薄膜
退火(玻璃)
材料科学
氧化镍
非阻塞I/O
扫描电子显微镜
化学浴沉积
沉积(地质)
氧化物
化学工程
分析化学(期刊)
无机化学
冶金
化学
纳米技术
复合材料
色谱法
有机化学
工程类
古生物学
催化作用
生物
沉积物
作者
Mónica Araceli Vidales-Hurtado,A. Mendoza-Galván
标识
DOI:10.1016/j.matchemphys.2007.06.036
摘要
Nickel oxide-based thin films were obtained using the chemical bath deposition method on glass and silicon substrates. The precursor solution used was a mixture of nickel nitrate, urea, and deionized water. Molar concentration of nickel (0.3–1.0 M), deposition time, and immersing cycles were considered as deposition variables. Infrared spectroscopy and X-ray diffraction data reveal that all as-deposited films correspond to the transparent turbostratic phase α(II)-Ni(OH)2. However, the rate of deposition depends on nickel content in the solution. After annealing in air at temperatures above of 300 °C, the films are transformed to the NiO phase and show a grey/black color. In these films, scanning electron microscopy images show aggregates of thin stacked sheets on their surface, such aggregates can be easily removed leaving only a thin NiO layer of about 30 nm adhered firmly to the substrate, regardless of nickel concentration in the solution and deposition time. In order to obtain thicker NiO films with good optical properties a procedure is developed performing several immersing–annealing cycles.
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