法诺平面
诺共振
接口(物质)
干扰(通信)
拓扑(电路)
联轴节(管道)
反演(地质)
共振(粒子物理)
物理
模式(计算机接口)
计算机科学
材料科学
光电子学
电信
分子
几何学
量子力学
数学
工程类
等离子体子
电气工程
地质学
操作系统
频道(广播)
构造盆地
古生物学
吉布斯等温线
冶金
作者
Xin Gu,Guidong Liu,Lingling Wang,Qi Lin
标识
DOI:10.35848/1882-0786/ac8334
摘要
Abstract We theoretically realize a highly robust Fano resonant structure. The occurrence of robust Fano resonance can be caused by the coupling of topological bright interface mode and topological dark interface mode at the interface between trivial and non-trivial insulators. Through the research of band structure, it is confirmed that the structure has the characteristic of specific band inversion, which can realize the topological phase transition. In addition, we verify that the Fano resonance is still robust in horizontal and vertical perturbations, which is significant for designing Fano-based devices to solve issues caused by manufacturing.
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