超晶格
光电子学
锑
暗电流
碲化镉汞
材料科学
响应度
探测器
光电探测器
光学
太赫兹辐射
可操作性
物理
计算机科学
软件工程
作者
B. Z. Nosho,Alexander R. Gurga,Sevag Terterian,Shuoqin Wang,R. Rajavel
摘要
Recent advances over the last several years in III-V strained-layer superlattice-based infrared detectors have lead this material system to emerge as a solid alternative to HgCdTe for dual-band focal plane arrays (FPAs). Rapid development of superlattice-based detectors has been realized by capitalizing on mature, III-V foundry-compatible processing. Furthermore, superlattice-based epitaxial wafers exhibit a high degree of lateral uniformity with low macroscopic defect densities (< 50 cm-2) and can achieve dark current levels comparable to HgCdTe detectors. In this paper, we review our recent efforts towards producing HD-format (1280x720, 12 μm pitch) superlattice-based, dual-band MWIR/LWIR FPAs. For a representative FPA, characterization was conducted in a pour-fill dewar at 80K, f/3 and using a blackbody range of 22°C to 32°C. For the MWIR band, the noise equivalent temperature difference (NETD) was 14.9 mK with a 3x median NETD operability of 99.91%. For the LWIR band, the median NETD was 28.1 mK with a 3x median NETD operability of 99.66%. To illustrate the manufacturability of superlattice technology, we will present results on 1280x720, 12 μm pitch MWIR/LWIR FPAs built over the last year at HRL through multiple fabrication lots utilizing 4" epiwafers.
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