透射电子显微镜
位错
材料科学
蚀刻(微加工)
原子力显微镜
结晶学
外延
电子显微镜
腐蚀坑密度
纳米技术
复合材料
光学
化学
物理
图层(电子)
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2000-01-01
卷期号:18 (1): 37-40
被引量:70
摘要
Clear results on the origin of etch pits are reported. The surfaces of high-quality GaN epitaxial layers were etched with molten KOH and observed by atomic force microscopy (AFM) and plan-view and cross-sectional transmission electron microscopy (TEM). AFM images for as-grown samples show dark spots indicating mixed dislocations. For etched samples, hexagonal-base etch pits were clearly observed, and the dark spots disappeared. TEM observations show that a mixed dislocation terminates at the bottom of each etch pit. The densities of etch pits and mixed dislocations are almost the same, i.e., around 3×108 cm−2. The origin of etch pits is the mixed dislocation, and the combination of KOH etching and AFM is found to be a better approach for two-dimensional evaluation of mixed dislocations.
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