抵抗
羧酸盐
极端紫外线
极紫外光刻
聚甲基丙烯酸甲酯
高分子化学
化学
材料科学
聚合物
立体化学
有机化学
纳米技术
物理
光学
激光器
图层(电子)
作者
James Passarelli,Michael Murphy,Ryan Del Re,Miriam Sortland,Jodi Hotalen,Levi Dousharm,Roberto Fallica,Yasin Ekinci,Mark Neisser,Daniel A. Freedman,Robert L. Brainard
出处
期刊:Journal of Micro-nanolithography Mems and Moems
[SPIE - International Society for Optical Engineering]
日期:2015-10-14
卷期号:14 (4): 043503-043503
被引量:24
标识
DOI:10.1117/1.jmm.14.4.043503
摘要
We have developed organometallic carboxylate compounds [RnM(O2CR′)2] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM(O2CR′)2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR′). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb(O2CR′)2 resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb(O2CR′)2 lend insight into the behavior of these resists.
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