Plasma-enabled multifunctional platform for gram-scale production of graphene and derivatives

石墨烯 材料科学 纳米技术 纳米材料 拉曼光谱 光学 物理
作者
Ana Dias,E. Felizardo,N. Bundaleska,M. V. Abrashev,Jivko Kissovski,Ana M. Ferraria,A.M. Botelho do Rego,Thomas Strunskus,P.A. Carvalho,A. Almeida,Janez Zavašnik,Eva Kovačević,Johannes Berndt,N. Bundaleski,Mohammed-Ramzi Ammar,Orlando M.N.D. Teodoro,Uroš Cvelbar,Luís L. Alves,B. Gonçalves,E. Tatarova
出处
期刊:Applied Materials Today [Elsevier BV]
卷期号:36: 102056-102056 被引量:9
标识
DOI:10.1016/j.apmt.2024.102056
摘要

Taking advantage of the high-energy-density microwave plasma environment as a unique 3D space for the self-assembly of free-standing nanostructures, a novel multifunctional platform for the continuous production of graphene and derivatives at the gram scale was developed. The platform is supported by a prototype plasma machine capable of performing a wide variety of industrially applicable processes within a single assembly environment. Free-standing graphene and nitrogen doped graphene, i.e., N-graphene nanosheets, and hybrid nanocomposites are assembled in a one-step process in seconds under atmospheric pressure conditions without the need of post-treatment. A single custom-designed machine enables the synthesis of an extensive array of hybrid nanomaterials featuring metal nanoparticles anchored in graphene. The method enables the conversion of a wide range of low-cost feedstock (e.g., ethanol, acetonitrile, etc.) into graphene and derivatives at a rate up to 30 mg/min. The resulting N-graphene sheets exhibit high quality, as evidenced by the highest reported presence of single atomic layers (45%), high ratio of 2D/G peak intensities in Raman spectra and N/O atomic ratio greater than one. The use of the obtained N-graphene in low secondary electron emission applications and in inkjet printing are explored. The presented plasma machine embodies significant potential to increase the effectiveness of plasma-driven process regarding productivity, costs and turnaround time.
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