光电子学
材料科学
响应度
光电探测器
氧化铟锡
透射率
肖特基二极管
肖特基势垒
图层(电子)
电极
砷化铟镓
半导体
砷化镓
纳米技术
二极管
化学
物理化学
作者
Chu,Mansun Chan,Yuang,Chyi,Lee
出处
期刊:Electronics Letters
[Institution of Engineering and Technology]
日期:1995-09-14
卷期号:31 (19): 1692-1694
被引量:3
摘要
A thin (200 Å) WSix film is used to improve the light admittance, without sacrificing the Schottky performance, of InAlAs/InGaAs metal-semiconductor-metal (MSM) photodetectors. A 73% transmittance was achieved at a wavelength of 1.55 µm. This thin layer followed by a thick layer of indium tin oxide (ITO), used as a gate material, demonstrated a responsivity of 0.44 A/W, which corresponds to a 70% improvement compared with the conventional thick metal gate MSM detectors.
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