过程(计算)
光学接近校正
块(置换群论)
计算机科学
忠诚
分解
工程制图
高保真
可制造性设计
图层(电子)
工程类
材料科学
机械工程
电气工程
数学
纳米技术
程序设计语言
生物
电信
生态学
几何学
作者
Youssef Drissi,Werner Gillijns,Jae Uk Lee,Ryan Ryoung Han Kim,Ahmed Hamed Fatehy,Rehab Kotb,Rajiv Sejpal,Germain Fenger,James Word
摘要
In this work we are introducing a manufacturing flow for the SALELE Process in details. Starting with layout decomposition, where the drawn layer is decomposed into 4 Masks: 2 Metal-like Masks, and 2 Block-like Masks. Then each of these masks is subjected to Optical Proximity Correction (OPC) process, and here we explain more about the OPC recipe development for each mask. Then we introduce a verification flow that performs two levels of verifications: (a) Litho verification, where the litho fidelity of each mask is quantified based on image quality measurements. (b) Final Manufactured shapes verification vs. expected output. This work has been carried out on an N3 candidate layout designed by IMEC.
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