The role of fluorination during the physicochemical erosion of yttria in fluorine-based etching plasmas

A physicochemical mechanism acting between the reactive plasma and the material surface controls the erosion of polycrystalline ceramics in fluorine containing etching plasmas. In this study, a Y2O3/YOF composite was exposed to a fluorine etching plasma. Relocalization enables the direct correlation of crystalline orientation with material response. Our study reveals an orientation dependent surface fluorination of Y2O3, which controls the etching resistance and morphology formation. Orientations near the low index planes (001), (010) and (100) exhibit the lowest stability due to a homogeneous surface reaction. The presented results help to extend the mechanistic understanding of the plasma-material interaction of Y2O3.