Study on properties of diamond-like carbon films deposited by RF ICP PECVD method for micro- and optoelectronic applications

In this paper, a comparison of Diamond-like Carbon (DLC) films with different sp3 fraction content prepared by Radio Frequency Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (RF ICP PECVD) was presented. Structural, surface, optical, and mechanical properties of deposited DLC films were analyzed with the use of a wide range of measurement techniques. The investigated films were deposited on silicon (Si), amorphous silica (SiO2), and metallic (Ti6Al4V) substrates at room temperature. The deposited DLC films have sp3 fraction content ranging from 35 % to 70 %, uniform, compact and dense microstructure. The investigation indicates that the properties of DLC films required for micro- and optoelectronic applications improve with the sp3 fraction content. The refractive index (n) increased from 1.976 to 2.086, packaging density (PD) from 0.964 to 0.744, electrical resistivity (ρ) from 2.1 ∙ 1010 to 4.4 ∙ 1011 Ωcm, hardness (H) from 16.4 19.1 to GPa and elastic modulus (E) from 109 to 129 GPa. However, the 50 % sp3 DLC thin film exhibited the highest resistance to cracking (H3/E2 = 0.44). The decrease of Urbach energy (EU) from 0.75 to 0.46 eV was observed for the DLC film with the highest sp3 fraction content, while all investigated DLC samples had similar optical bandgap energy (Egopt ≈ 1.3 eV). The research has shown that it is possible to obtain DLC coatings using the RF ICP PECVD technique that has better properties than films deposited by the classic PECVD technique.