温度系数
偏压
信号(编程语言)
带隙基准
材料科学
电压
电容器
电气工程
电压基准
计算机科学
物理
光电子学
分析化学(期刊)
化学
工程类
色谱法
跌落电压
程序设计语言
作者
Ryu Ogiwara,D. Takashima,Sumiko Doumae,S. Shiratake,Ryousuke Takizawa,H. Shiga
出处
期刊:IEEE Journal of Solid-state Circuits
[Institute of Electrical and Electronics Engineers]
日期:2015-03-12
卷期号:50 (5): 1324-1331
被引量:6
标识
DOI:10.1109/jssc.2015.2405932
摘要
This paper presents highly reliable reference bitline bias designs for 64 Mb and 128 Mb chain FeRAM™. The hysteresis shape deformation of ferroelectric capacitor due to temperature variation causes cell signal level shifts of both "1" and "0" data. The reference bitline bias of 64 Mb chip is designed to keep intermediate value of "1" and "0" data at any operating temperatures from -40 ° C to 85 ° C by introducing a modified band-gap reference circuit with 3 bit temperature coefficient trimmers and 6 bit digital-to-analog converter (DAC) using laser fuses. The measured result shows the improvement of tail-to-tail cell signal windows by ±22 mV. Moreover, a new reference bias circuit called the "elevator circuit" with 3 bit temperature coefficient trimmers using ferroelectric fuses installed in a 128 Mb chip compensates array operating voltage VAA fluctuation as well as temperature variation. The elevator circuit enables the temperature dependency control at low external VDD of 1.8 V. This improves cell signal window by ±40 mV. The elevator circuit also varies reference bitline bias with array operating voltage VAA variation, resulting in improvement of cell signal windows by ±44 mV in the range of 1.5 V ±0.2 V VAA.
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