Atomic layer deposited SnO2/ZnO composite thin film sensors with enhanced hydrogen sensing performance

原子层沉积 材料科学 复合数 薄膜 异质结 光电子学 沉积(地质) 氢传感器 化学工程 纳米技术 图层(电子) 复合材料 催化作用 化学 古生物学 工程类 有机化学 生物 生物化学 沉积物
作者
Xin-Yue Zhang,Qiang Ren,Chen Wang,Lin Zhu,Wen-Juan Ding,Yanqiang Cao,Wei-Ming Li,Di Wu,Aidong Li
出处
期刊:Applied Surface Science [Elsevier BV]
卷期号:639: 157973-157973 被引量:13
标识
DOI:10.1016/j.apsusc.2023.157973
摘要

Hydrogen gas (H2) has long been regarded as a clean and renewable energy carrier alternative to the fossil fuel, therefore the development of highly sensitive and reliable hydrogen sensor is imperative for the large-scale implementation of green energy hydrogen. In this work, SnO2, ZnO thin film and SnO2/ZnO composite thin film H2 sensors were fabricated on SiO2/Si substrates by atomic layer deposition (ALD). The effect of ALD cycles and heat treatment temperatures on the sensing properties of the thin film sensors was investigated deeply. It is found that the 100-cycle SnO2/150-cycle ZnO composite film shows the best H2-sensing performance such as large response of 93 to 30 ppm H2 at 200 ℃, fast response/recovery time of 50 s/29 s, and low detection limit of 250 ppb. Moreover, the response of SnO2/ZnO composite film sensor is 10 times and 2 times higher than that of the pure ZnO and SnO2 thin film ones at working temperature of 200℃, respectively. A possible mechanism for performance improvement of the SnO2/ZnO composite film H2 sensor is proposed, attributed to the synergistic effect of the SnO2-ZnO heterojunction and the oxygen vacancies in the SnO2 film. ALD may be a feasible strategy to construct Si-based highly sensitive hydrogen sensors for micro-electromechanical system application.
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