异质结
原子探针
材料科学
原子单位
半导体
电子断层摄影术
纳米
光电子学
表征(材料科学)
表面光洁度
纳米技术
扫描透射电子显微镜
透射电子显微镜
物理
量子力学
复合材料
作者
Sebastian Koelling,Lucas E. A. Stehouwer,Brian Paquelet Wuetz,Giordano Scappucci,Oussama Moutanabbir
标识
DOI:10.1002/admi.202201189
摘要
Abstract Atom probes generate three‐dimensional atomic‐scale tomographies of material volumes corresponding to the size of modern‐day solid‐state devices. Here, the capabilities of atom probe tomography are evaluated to analyze buried interfaces in semiconductor heterostructures relevant for electronic and quantum devices. Employing brute‐force search, the current dominant reconstruction protocol to generate tomographic three‐dimensional images from Atom Probe data is advanced to its limits. Using Si/SiGe heterostructure for qubits as a model system, the authors show that it is possible to extract interface properties like roughness and width that agree with transmission electron microscopy observations on the sub‐nanometer scale in an automated and highly reproducible manner. The demonstrated approach is a versatile method for atomic‐scale characterization of buried interfaces in semiconductor heterostructures.
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