Tailoring ultrafast carrier dynamics in GeS and GeSe via Cu intercalation

Germanium sulfide (GeS) and germanium selenide (GeSe) are layered 2D van der Waals materials that belong to a family of group-IV monochalcogenides. These semiconductors have high carrier mobilities and moderate band gaps in the near infrared. Additionally, we have demonstrated that above gap photoexcitation results in ultrafast surface photocurrents and emission of THz pulses due to a spontaneous ferroelectric polarization that breaks inversion symmetry in the monolayer. Beyond the sub-picosecond time scales of shift currents, photoexcited carriers in both materials result in long-lived transient conductivity. We find that 800 nm excitation results in longer lived free photocarriers, persisting for hundreds of picoseconds to several nanoseconds, compared to tens to hundreds of picoseconds lifetimes for 400 nm excitation. Here, we report on tailoring the free photoexcited carrier lifetimes by intercalation of zero-valent Cu into the van der Waals gaps of GeS and GeSe. Density functional theory calculations predict that Cu atoms introduce mid-gap states. We demonstrate that intercalating only $\sim 3$ atomic % of zero-valent Cu reduces the carrier lifetime by as much as two-to-four-fold, raising the prospects of these materials being used for high-speed optoelectronics.