密度泛函理论
硅
杂质
材料科学
氮气
碳纤维
氧气
电子结构
结晶学
晶体缺陷
凝聚态物理
化学物理
计算化学
原子物理学
化学
物理
光电子学
量子力学
复合数
复合材料
作者
Navaratnarajah Kuganathan,Stavros‐Richard G. Christopoulos,Konstantina Papadopoulou,E. N. Sgourou,A. Chroneos,C. A. Londos
标识
DOI:10.1142/s0217984923501543
摘要
Nitrogen (N) is an important impurity in silicon (Si), which associates with impurities as well as with other defects to form defect complexes. The knowledge of the properties and behavior of defect structures containing carbon (C), N and oxygen (O) is important for the Si–based electronic technology. Here, we employ density functional theory (DFT) calculations to investigate the association of nitrogen with carbon and oxygen defects to form the C i N and C i NO i defects. We provide evidence of the formation of these defects and additional details of their structure, their density of states (DOS) and Bader charges. Therefore, C i N and C i NO i defects are now well characterized.
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