图层(电子)
材料科学
电子探针
基质(水族馆)
溶解
复合材料
双层(生物学)
矿物学
化学工程
冶金
化学
海洋学
工程类
地质学
作者
Takashi Nakano,Toshihiro Iizuka,Tomoyuki Takada,Takashi Yamaguchi
标识
DOI:10.1111/j.1151-2916.1995.tb08876.x
摘要
Chemical interaction between RuO 2 ‐glass thick‐film resistors and substrates was studied by observing microstructural changes in model double‐layer thick films, which were composed of a top glass layer and an RuO 2 layer. The concentration profiles of Al, Pb, and Ru in the film were analyzed. A new glass layer formed on the alumina substrate during firing, the formation of which resulted from dissolution of A1 2 O 3 into glass. A mechanism of microstructural changes has been proposed based on the results of EPMA.
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