Hydrogen desorption from sand-blasted and acid-etched titanium surfaces after glow-discharge treatment

解吸 材料科学 氢化钛 热脱附光谱法 表面粗糙度 氧化物 分析化学(期刊) 辉光放电 热脱附 无机化学 等离子体 化学 复合材料 吸附 冶金 物理化学 色谱法 有机化学 物理 量子力学
作者
B.‐O. Aronsson,B. Hj�rvarsson,L. Frauchiger,M. Taborelli,P. -H. VALLOTTON,P. Descouts
出处
期刊:Journal of Biomedical Materials Research [Wiley]
卷期号:54 (1): 20-29 被引量:38
标识
DOI:10.1002/1097-4636(200101)54:1<20::aid-jbm3>3.0.co;2-z
摘要

Hydrogen desorption from argon plasma-treated titanium implants with a high surface roughness was studied. Implants with a high surface roughness have shown an increase in mechanical stability in bone tissue and a different behavior of osteoblasts in vitro. High surface roughness was produced by grit blasting and acid etching, resulting in an increase of the sub-surface hydrogen concentration and the formation of a titanium hydride. After an argon plasma treatment the surface oxide, which always covers titanum surfaces exposed to an oxygen-containing environment, and some of the hydrogen were sputtered away, decreasing the hydrogen concentration in the sub-surface region. Nuclear reaction analysis was used to determine the hydrogen concentration as a function of depth. The total amount of sub-surface (down to a depth of ≤ 2 μm) hydrogen remaining after plasma treatment decreased with increasing plasma intensity to below the levels observed in non-acid-etched samples (∼1–2%). Thermal desorption spectroscopy was used for desorption studies and investigation of H2 desorption activation energies. With a surface oxide present, the onset of hydrogen desorption is at ca 400°C, which is the oxide decomposition temperature in vacuum, with an activation energy of ca 2 eV/molecule of H2. After plasma treatment, that is, without surface oxide present, the onset of desorption was observed at ca 300°C and with an activation energy of ca 0.8 eV/molecule of H2, indicating a bulk diffusion-limited desorption. © 2000 John Wiley & Sons, Inc.
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