覆盖
进程窗口
计算机科学
GSM演进的增强数据速率
过程(计算)
维数(图论)
计量学
平版印刷术
航程(航空)
算法
临界尺寸
可靠性工程
计算机工程
人工智能
统计
数学
工程类
光学
程序设计语言
物理
纯数学
航空航天工程
作者
Chris A. Mack,Mike Adel
摘要
For the most advanced nodes, edge placement errors are typically dominated by stochastics, necessitating a rigorous stochastics approach to modeling and measuring edge placement errors and their contributors. In this work, a new approach to developing an edge placement error (EPE) model useful for lot dispositioning or EPE budgeting is presented. Approach: As an example of the proposed approach, a rigorous EPE model is developed for the case of complementary lithography, where dense lines and spaces are cut with a second patterning step. This model gives rise to the generation of an Overlay Process Window, the range of overlay errors that can be tolerated in the presence of stochastics critical dimension and placement errors of the individual layers. The resulting model uses only measurable quantities and allows the prediction of EPE-based failure rates for the purpose of lot dispositioning. One interesting outcome is that Angstrom-level changes in the 1-sigma stochastics terms produces nanometer-level changes in the overlay process window. This new EPE modeling approach provides a more rigorous and accurate method for lot dispositioning and EPE budgeting than prior approaches.
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