电镀
铬
材料科学
六价铬
阳极
冶金
腐蚀
电流密度
电化学
复合材料
电极
化学
图层(电子)
量子力学
物理
物理化学
作者
Dongwook Lim,Bonil Ku,Dongjo Seo,Chaewon Lim,Euntaek Oh,Sang Eun Shim,Sung‐Hyeon Baeck
标识
DOI:10.1016/j.ijrmhm.2020.105213
摘要
Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance.
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