显微镜
扫描电镜
光学
数值孔径
材料科学
超分辨显微术
薄层荧光显微镜
荧光团
双光子激发显微术
显微镜
激发
光学切片
点扩散函数
光学显微镜
波长
受激发射
光电子学
扫描共焦电子显微镜
物理
激光器
荧光
扫描电子显微镜
量子力学
作者
Rainer Heintzmann,Thomas M. Jovin,Christoph Cremer
标识
DOI:10.1364/josaa.19.001599
摘要
The resolution of optical microscopy is limited by the numerical aperture and the wavelength of light. Many strategies for improving resolution such as 4Pi and I5M have focused on an increase of the numerical aperture. Other approaches have based resolution improvement in fluorescence microscopy on the establishment of a nonlinear relationship between local excitation light intensity in the sample and in the emitted light. However, despite their innovative character, current techniques such as stimulated emission depletion (STED) and ground-state depletion (GSD) microscopy require complex optical configurations and instrumentation to narrow the point-spread function. We develop the theory of nonlinear patterned excitation microscopy for achieving a substantial improvement in resolution by deliberate saturation of the fluorophore excited state. The postacquisition manipulation of the acquired data is computationally more complex than in STED or GSD, but the experimental requirements are simple. Simulations comparing saturated patterned excitation microscopy with linear patterned excitation microscopy (also referred to in the literature as structured illumination or harmonic excitation light microscopy) and ordinary widefield microscopy are presented and discussed. The effects of photon noise are included in the simulations.
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