光学
材料科学
栅栏
制作
绝缘体上的硅
宽带
波导管
光电子学
带宽(计算)
耦合损耗
氮化硅
硅
衍射光栅
插入损耗
物理
光纤
电信
替代医学
病理
医学
计算机科学
作者
Purnima Sethi,Anubhab Haldar,Shankar Kumar Selvaraja
出处
期刊:Optics Express
[Optica Publishing Group]
日期:2017-04-25
卷期号:25 (9): 10196-10196
被引量:30
摘要
A novel design of large bandwidth, fabrication tolerant, CMOS-compatible compact tapers (15 um) have been proposed and experimentally demonstrated in silicon-on-insulator. The proposed taper along with linear grating couplers for spot-size conversion exhibits no degradation in the coupling efficiency compared to a standard focusing grating in 1550 nm band. A single taper design has a broadband operation over 600 nm that can be used in O, C and L-band. The proposed compact taper is highly tolerant to fabrication variations; 80 nm change in the taper width and 200 nm in end waveguide width varies the taper transmission by <0.4 dB. The footprint of the device i.e. taper along with the linear gratings is ~ 250 {\mu}m2; this is 20X smaller than the adiabatic taper and 2X smaller than the focusing grating coupler.
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