带隙
薄膜
材料科学
溅射沉积
氧化镍
分析化学(期刊)
扫描电子显微镜
拉曼光谱
非阻塞I/O
光谱学
能量色散X射线光谱学
透射率
溅射
氧化物
光学
光电子学
化学
纳米技术
复合材料
冶金
物理
催化作用
量子力学
生物化学
色谱法
作者
M. Terlemezoglu,Özge Sürücü,M. Isik,Nizami Gasanly,M. Parlak
标识
DOI:10.1007/s00339-021-05197-y
摘要
In this work, nickel oxide thin films were deposited by radio frequency magnetron sputtering technique. X-ray diffraction (XRD), scanning electron microscopy and energy-dispersive X-ray analysis methods were applied to reveal the structural and morphological properties of sputtered thin films. The XRD pattern of films confirmed the presence of the cubic phase of nickel oxide with the preferential orientation of (200) direction. The surface morphology of thin films was observed as almost uniform and smooth. Optical aspects of sputtered film were studied by employing the room temperature Raman and temperature-dependent transmittance spectroscopy techniques in the range of 10–300 K. Tauc relation and derivative spectroscopy techniques were applied to obtain the band gap energy of the films. In addition, the relation between the band gap energy and the temperature was investigated in detail considering the Varshni optical model. The absolute zero band gap energy, rate of change of band gap energy, and Debye temperature were obtained as 3.57 eV, − 2.77 × 10–4 eV/K and 393 K, respectively.
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