薄脆饼
光刻胶
材料科学
离子注入
光电子学
离子束
离子
纳米技术
化学
图层(电子)
有机化学
作者
M. Mack,G. Ryding,D. H. Douglas‐Hamilton,K. Steeples,M. Farley,V. Gillis,Nicholas G. White,A. B. Wittkower,R. Lambracht
标识
DOI:10.1016/0168-583x(85)90665-2
摘要
Ion implantation into insulating layers results in an accumulation of surface charge. If this charge is excessive, microscopic but easily observed punch through craters can be produced. In addition, wafer charging can result in non-uniform implants. The effect is particularly insidious because monitor wafers without insulating layers will show no effect while adjacent product wafers with photoresist or oxide coatings may show gross non-uniformities. Well designed electron flooding will relieve both effects.
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