Synthesis of a PCST-containing acrylic polymers and its application in negative-tone photoresist

The process design and synthesis of new acrylate photoresist is still a challenge due to the limited resolution and sensitivity of resist. In this report, acrylate derivatives with different p-chlorostyrene (PCST) contents were prepared. The effects of different monomer contents on the film-forming properties and sensitivity of the polymers were discussed. The introduction of PCST significantly improves the thermal stability and film-forming properties of the polymers, and reduces the polydispersity (PDI) of the polymers to a certain extent, facilitating the achievement of high sensitivity and resolution of chemically amplified resists (CARs). Under optimized conditions, a final linewidth of 105 nm can be obtained. This new acrylate photoresist with good thermal stability and high resolution is also expected to be used in the next generation of lithography.