氮化镓
门驱动器
逻辑门
材料科学
联锁
CMOS芯片
电子工程
光电子学
电气工程
工程类
电压
复合材料
图层(电子)
作者
Yangyang Lu,Jun-Jie Zhu,Weifeng Sun,Yunwu Zhang,Kongsheng Hu,Zhicheng Yu,Jingwen Leng,Shikang Cheng,Sen Zhang
标识
DOI:10.1109/ispsd.2018.8393607
摘要
Benefit from the presented new Common Mode Dual-Interlock (CMDI) structure, a 600V high-side gate driver base on norma 0.5μm 600V Bipolar-CMOS-DMOS (BCD) technology achieving the high dV S /dt noise immunity larger than 85V/ns and low propagation delay less than 22ns for enhancement mode gallium nitride (GaN) devices is proposed in this paper.
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