Simulation investigations on stepwise penetration of virtual anode in pseudospark discharge

阴极 阳极 原子物理学 电子 渗透(战争) 阴极射线 等离子体 物理 离子 次级电子 二次排放 气体放电 材料科学 电极 化学 核物理学 工程类 量子力学 运筹学 物理化学
作者
Guoxiang Sun,Xia Wang,Jiaqi Yan,Saikang Shen,Tianyi Shang,Weidong Ding
出处
期刊:Physics of Plasmas [American Institute of Physics]
卷期号:29 (1) 被引量:12
标识
DOI:10.1063/5.0069833
摘要

Pseudospark discharge is a special low pressure discharge and has been widely used in the gas switch and electron beam sources. From experiments, when the work pressure is relatively low, the electron beam current or loop current generated by a pseudospark discharge usually has two or more peaks, which has not been fully explained. In this paper, a single-gap pseudospark discharge model is established using 2D kinetic plasma simulation code VSim to study this phenomenon. According to the simulation results, when the anode voltage is 20 kV and the helium pressure is 100 Pa, the current has two peaks, which is similar to the experimental results, accompanied by the stepwise penetration of the virtual anode. This is mainly related to the formation and disappearance of the potential barrier in the cathode hole region. The formation of the potential barrier is caused by the consumption of ions at the cathode hole, and the disappearance is caused by the increase in electrons in the cathode cavity. By classifying the electrons, it is found that the increased electrons are generated by secondary emission caused by ion bombardment on the wall of the cathode. The simulation results also show that the stepwise penetration of the virtual anode can be suppressed or eliminated by increasing the working gas pressure, the secondary electron yield of the cathode material, or the trigger intensity.
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