Chemical Mechanical Polishing of a Fluorinated Carbon Low Dielectric Constant Interlayer and a Tantalum Nitride Barrier Layer by Magnesium Oxide Slurry

Polishing of a low dielectric constant fluorinated carbon blanket layer is performed by a magnesium oxide slurry. Although deep scratches are formed at the surface when polished by fumed silica and cellium oxide slurries, such scratches are not formed when polished by slurry. A tantalum nitride barrier layer is also polished by a slurry. A removal rate of is attained in this layer. ©1999 The Electrochemical Society