X射线光电子能谱
高定向热解石墨
原子层沉积
成核
沉积(地质)
热解炭
材料科学
石墨
图层(电子)
分析化学(期刊)
吸附
化学工程
纳米技术
化学
物理化学
复合材料
环境化学
热解
有机化学
工程类
古生物学
生物
沉积物
作者
Adam Pirkle,Stephen McDonnell,B. Lee,J. Kim,Luigi Colombo,Robert M. Wallace
摘要
We present a study of the nucleation of atomic layer deposition of Al2O3 on highly oriented pyrolytic graphite (HOPG) using trimethlyaluminum (TMA) with ozone as the oxidant (TMA/O3). In situ x-ray photoelectron spectroscopy (XPS) is used to study TMA/O3 depositions on HOPG. We examine the dependence of TMA/O3 nucleation on deposition temperature and characterize the morphology and uniformity of deposited films by ex situ atomic force microscopy. The impact of several predeposition surface treatments of the graphite surface condition is discussed, particularly with regard to the presence of adsorbed atmospheric contamination.
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