黑硅
硅
材料科学
纳米技术
各向同性腐蚀
反应离子刻蚀
蚀刻(微加工)
光电子学
图层(电子)
作者
Zheng Fan,Danfeng Cui,Zengxing Zhang,Zhou Zhao,Hongmei Chen,Yanyun Fan,Penglu Li,Zhidong Zhang,Chenyang Xue,Shubin Yan
出处
期刊:Nanomaterials
[Multidisciplinary Digital Publishing Institute]
日期:2020-12-26
卷期号:11 (1): 41-41
被引量:81
摘要
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on. Because of the material property, black silicon is applied in many spheres of a photodetector, photovoltaic cell, photo-electrocatalysis, antibacterial surfaces, and sensors. With the development of fabrication technology, black silicon has expanded in more and more applications and has become a research hotspot. Herein, this review systematically summarizes the fabricating method of black silicon, including nanosecond or femtosecond laser irradiation, metal-assisted chemical etching (MACE), reactive ion etching (RIE), wet chemical etching, electrochemical method, and plasma immersion ion implantation (PIII) methods. In addition, this review focuses on the progress in multiple black silicon applications in the past 10 years. Finally, the prospect of black silicon fabricating and various applications are outlined.
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