光致发光
带隙
材料科学
直接和间接带隙
半导体
锗
宽禁带半导体
光电子学
凝聚态物理
硅
物理
作者
Mee‐Yi Ryu,Tom Harris,Y. K. Yeo,Richard T. Beeler,John Kouvetakis
摘要
Temperature (T)-dependent photoluminescence (PL) has been investigated for both p-Ge and n-Ge1-ySny films grown on Si substrates. For the p-Ge, strong direct bandgap (ED) along with weak indirect bandgap related (EID) PL at low temperatures (LTs) and strong ED PL at room temperature (RT) were observed. In contrast, for the n-Ge1-ySny, very strong dominant EID PL at LT and strong ED PL were observed at RT. This T-dependent PL study indicates that the indirect-to-direct bandgap transitions of Ge1-ySny might take place at much lower Sn contents than the theory predicts, suggesting that these Ge1-ySny could become very promising direct bandgap semiconductors.
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