Elucidating the Mechanism of Self-Healing in Hydrogel-Lead Halide Perovskite Composites for Use in Photovoltaic Devices

材料科学 X射线光电子能谱 钙钛矿(结构) 聚合物 相对湿度 化学工程 卤化物 热稳定性 复合材料 无机化学 化学 热力学 物理 工程类
作者
Dan Zhao,Tom A Flavell,Fahad Aljuaid,Stephen Edmondson,Ben F. Spencer,Alex S. Walton,Andrew G. Thomas,Wendy R. Flavell
出处
期刊:ACS Applied Materials & Interfaces [American Chemical Society]
卷期号:15 (23): 28008-28022 被引量:1
标识
DOI:10.1021/acsami.3c03359
摘要

Since the emergence of organometal halide perovskite (OMP) solar cells, there has been growing interest in the benefits of incorporating polymer additives into the perovskite precursor, in terms of both photovoltaic device performance and perovskite stability. In addition, there is interest in the self-healing properties of polymer-incorporated OMPs, but the mechanisms behind these enhanced characteristics are still not fully understood. Here, we study the role of poly(2-hydroxyethyl methacrylate) (pHEMA) in improving the stability of methylammonium lead iodide (MAPI, CH3NH3PbI3) and determine a mechanism for the self-healing of the perovskite-polymer composite following exposure to atmospheres of differing relative humidity, using photoelectron spectroscopy. Varying concentrations of pHEMA (0-10 wt %) are incorporated into a PbI2 precursor solution during the conventional two-step fabrication method for producing MAPI. It is shown that the introduction of pHEMA results in high-quality MAPI films with increased grain size and reduced PbI2 concentration compared with pure MAPI films. Devices based on pHEMA-MAPI composites exhibit an improved photoelectric conversion efficiency of 17.8%, compared with 16.5% for a pure MAPI device. pHEMA-incorporated devices are found to retain 95.4% of the best efficiency after ageing for 1500 h in 35% RH, compared with 68.5% achieved from the pure MAPI device. The thermal and moisture tolerance of the resulting films is investigated using X-ray diffraction, in situ X-ray photoelectron spectroscopy (XPS), and hard XPS (HAXPES). It is found that exposing the pHEMA films to cycles of 70 and 20% relative humidity leads to a reversible degradation, via a self-healing process. Angle-resolved HAXPES depth-profiling using a non-destructive Ga Kα source shows that pHEMA is predominantly present at the surface with an effective thickness of ca. 3 nm. It is shown using XPS that this effective thickness reduces with increasing temperature. It is found that N is trapped in this surface layer of pHEMA, suggesting that N-containing moieties, produced during reaction with water at high humidity, are trapped in the pHEMA film and can be reincorporated into the perovskite when the humidity is reduced. XPS results also show that the inclusion of pHEMA enhances the thermal stability of MAPI under both UHV and 9 mbar water vapor pressure.
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