Critical Review of Nanoindentation-Based Numerical Methods for Evaluating Elastoplastic Material Properties

纳米压痕 缩进 材料科学 刚度 材料性能 有限元法 机械工程 复合材料 结构工程 工程类
作者
Xu Long,Ruipeng Dong,Yuezeng Su,Chao Chang
出处
期刊:Coatings [Multidisciplinary Digital Publishing Institute]
卷期号:13 (8): 1334-1334 被引量:5
标识
DOI:10.3390/coatings13081334
摘要

It is well known that the elastoplastic properties of materials are important indicators to characterize their mechanical behaviors and are of guiding significance in the field of materials science and engineering. In recent years, the rapidly developing nanoindentation technique has been widely used to evaluate various intrinsic information regarding the elastoplastic properties and hardness of various materials such as metals, ceramics, and composites due to its high resolution, versatility, and applicability. However, the nanoindentation process of indenting materials on the nanoscale provides the measurement results, such as load-displacement curves and contact stiffness, which is challenging to analyze and interpret, especially if contained in a large amount of data. Many numerical methods, such as dimensionless analysis, machine learning, and the finite element model, have been recently proposed with the indentation techniques to further reveal the mechanical behavior of materials during nanoindentation and provide important information for material design, property optimization, and engineering applications. In addition, with the continuous development of science and technology, automation and high-throughput processing of nanoindentation experiments have become a future trend, further improving testing efficiency and data accuracy. This paper critically reviewed various numerical methods for evaluating elastoplastic constitutive properties of materials based on nanoindentation technology, which aims to provide a comprehensive understanding of the application and development trend of the nanoindentation technique and to provide guidance and reference for further research and applications.

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