氧化物
退火(玻璃)
栅氧化层
材料科学
等效氧化层厚度
湿式氧化
硅
表面光洁度
表面粗糙度
氧化硅
随时间变化的栅氧化层击穿
氧化物薄膜晶体管
形成气体
化学工程
光电子学
复合材料
图层(电子)
化学
冶金
电气工程
催化作用
氮化硅
薄膜晶体管
电压
工程类
晶体管
生物化学
作者
W. R. Cho,Young-Cheol Kim,Eung-Soo Kim,Hong Seok Kim
摘要
Electrical properties of ultra thin gate oxide in thickness of 4 to 10 nm have been evaluated, manufactured either by wet or dry oxidation process. The relationship between silicon/oxide interfacial structure and the electrical properties was analyzed. In addition, the effect of post oxidation annealing (POA) temperature on improvement of the electrical characteristics of the gate oxide has been evaluated when the temperature was lower than 950°C, the conventional POA temperature. The leakage current of the ultra thin gate oxide was found to increase as the thickness decreased. The accelerated degradation of breakdown characteristics was observed as the thickness decreased below 7 nm. The physical properties of the silicon/oxide interface were found to depend on oxidation ambient and POA temperature. The wet oxidation process resulted in a smoother surface than the dry oxidation process did. The POA treatment further decreased the micro-roughness of the silicon/oxide interface. The electrical properties of the gate oxide were found to be closely related to the micro-roughness of the silicon/oxide interface. Good electrical properties were obtained for the gate oxide manufactured by the wet oxidation process followed by the POA treatment at 850°C.
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