光学
超材料
栅栏
极化(电化学)
衍射光栅
材料科学
硅
光电子学
物理
物理化学
化学
作者
Qianli Yu,Zhenzhao Guo,Jiabao Zhu,Lei Zhang,Peng Hao,Jinbiao Xiao,Ting Feng,Shengbao Wu
出处
期刊:Optics Letters
[The Optical Society]
日期:2024-07-15
卷期号:49 (15): 4326-4326
被引量:2
摘要
We present what we believe is the first report on a polarization-insensitive 3 × 3 silicon star-crossing utilizing a composite subwavelength metamaterial waveguide structure. Two different types of subwavelength grating metamaterials (nanohole grating and fan-shaped bent subwavelength grating) are respectively used to address diffraction issues in the crossing region and mode interference issues caused by a compact non-adiabatic design. This approach results in a device with an ultra-compact footprint of 12.68 × 10.98 µm 2 on a standard 220 nm silicon-on-insulator (SOI) platform. Simulation results show low insertion loss (IL) values of <0.2 dB/0.3 dB and suppressed cross talk (CT) levels of <−27.2 dB/−23.6 dB for TE/TM polarizations across a wavelength range of 100 nm (1500–1600 nm). Experimental measurements of the fabricated devices confirm outstanding performance, with IL values of <0.35 dB/0.4 dB and CT levels of <−31.5 dB/−28.6 dB for TE/TM polarization in the C-band.
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