材料科学
等离子体子
氮化钛
功勋
基质(水族馆)
锡
微观结构
溅射沉积
光电子学
溅射
氮化物
沉积(地质)
钛
薄膜
纳米技术
图层(电子)
复合材料
冶金
古生物学
地质学
海洋学
生物
沉积物
作者
Mateusz Nieborek,Cezariusz Jastrzębski,Tomasz Płociński,Piotr Wróbel,Aleksandra Seweryn,Jarosław Judek
标识
DOI:10.1038/s41598-024-56406-6
摘要
Abstract A current approach to depositing highly plasmonic titanium nitride films using the magnetron sputtering technique assumes that the process is performed at temperatures high enough to ensure the atoms have sufficient diffusivities to form dense and highly crystalline films. In this work, we demonstrate that the plasmonic properties of TiN films can be efficiently tuned even without intentional substrate heating by influencing the details of the deposition process and entailed films’ stoichiometry and microstructure. We also discuss the dependence of the deposition time/films’ thickness on the optical properties, which is another degree of freedom in controlling the optical response of the refractory metal nitride films. The proposed strategy allows for robust and cost-effective production of large-scale substrates with good plasmonic properties in a CMOS technology-compatible process that can be further processed, e.g., structurized. All reported films are characterized by the maximal values of the plasmonic Figure of Merit (FoM = − ε 1 / ε 2 ) ranging from 0.8 to 2.6, and the sample with the best plasmonic properties is characterized by FoM at 700 nm and 1550 nm that is equal 2.1 in both cases. These are outstanding results, considering the films’ polycrystallinity and deposition at room temperature onto a non-matched substrate.
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