成核
铜
扩散
循环伏安法
硫化铜
柯石英
辉铜矿
动力学
阳极
材料科学
化学物理
化学
镀铜
无机化学
黄铜矿
电化学
电极
电镀
氧化铜
热力学
物理化学
有机化学
物理
量子力学
作者
B.R. Scharifker,R. Rugeles,J. Mozota
标识
DOI:10.1016/0013-4686(84)87057-7
摘要
The anodic formation of copper sulphide on copper was studied at various pH and sulphide concentrations. The kinetics and mechanism of film formation were elucidated by cyclic voltammetry and transient techniques. It was found that the film grows by a nucleation and growth mechanism controlled by localized hemispherical diffusion which, at long times, turns into linear diffusion due to overlapping of the diffusion zones of neighbouring centres. The analysis indicates that the number of active centres available for the nuclei formation is finite. The kinetic parameters for the nucleation have been interpreted according to the classical and atomistic models of nucleation. It is also shown that potentiostatic and galvanostatic techniques give comparable results.
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