材料科学
硅
钝化
非晶硅
碳化硅
晶体硅
纳米晶硅
光电子学
电接点
异质结
氧化物
纳米技术
复合材料
图层(电子)
冶金
作者
Malte Köhler,Manuel Pomaska,Florian Lentz,F. Finger,Uwe Rau,Kaining Ding
标识
DOI:10.1021/acsami.8b02002
摘要
Transparent passivated contacts (TPCs) using a wide band gap microcrystalline silicon carbide (μc-SiC:H(n)), silicon tunnel oxide (SiO2) stack are an alternative to amorphous silicon-based contacts for the front side of silicon heterojunction solar cells. In a systematic study of the μc-SiC:H(n)/SiO2/c-Si contact, we investigated selected wet-chemical oxidation methods for the formation of ultrathin SiO2, in order to passivate the silicon surface while ensuring a low contact resistivity. By tuning the SiO2 properties, implied open-circuit voltages of 714 mV and contact resistivities of 32 mΩ cm2 were achieved using μc-SiC:H(n)/SiO2/c-Si as transparent passivated contacts.
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