润湿
钛
材料科学
表面粗糙度
接触角
表面光洁度
扫描电子显微镜
俄歇电子能谱
氧化物
化学成分
抛光
氧化钛
化学工程
复合材料
冶金
化学
物理
有机化学
核物理学
工程类
作者
M. Taborelli,Marc Jobin,Patrice François,Pierre Vaudaux,Michela Tonetti,Serge Szmukler‐Moncler,James Simpson,P. Descouts
标识
DOI:10.1034/j.1600-0501.1997.080307.x
摘要
We present an investigation of the physico‐chemical surface properties of commercially pure titanium coverslips which were submitted to various treatments designed to optimize their topography in view of application in oral implantology. The surface microroughness, chemical composition and water wettability were analyzed on titanium coverslips prepared by mechanical polishing, acid attack in HCl/HZSOI, after mechanical polishing or sandblasting, and titanium plasma‐spray. The chemical composition has been measured by Auger electron spectroscopy. The treatments have no major influence on the surface chemical composition and all the samples display a composition approaching that of TiOZ with minor amounts of carbon. sulfur, silicon and calcium as impurities. The roughness has been measured by scanning force microscopy on an area of 20 μm x 20 μm on each sample. Polished titanium is smooth (peak‐to‐valley roughness 81 nm). whereas the acid‐attacked surfaces exhibit a micro‐roughness in the pm range (2100 nm for polished and acid attacked; 3600 nm for sandblasted and acid attacked) which is quite reproducible over large areas of the sample. The acid attacked samples present a subsurface layer which contains hydrogen below the native passivating oxide layer. Water wettability measurement shows that all surfaces are hydrophobic with a slightly higher contact angle for the acid attacked surfaces. The different treatments analyzed in this study essentially influence the surface roughness by preserving the chemical composition and the wettability properties of titanium native oxide surface layer.
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