双稳态
微尺度化学
有限元法
深反应离子刻蚀
梁(结构)
机制(生物学)
材料科学
结构工程
机械
光学
物理
蚀刻(微加工)
工程类
反应离子刻蚀
纳米技术
光电子学
数学
图层(电子)
量子力学
数学教育
作者
J. Qiu,J.H. Lang,Alex Slocum
标识
DOI:10.1109/jmems.2004.825308
摘要
This paper presents a monolithic mechanically-bistable mechanism that does not rely on residual stress for its bistability. The typical implementation of this mechanism is two curved centrally-clamped parallel beams, hereafter referred to as "double curved beams". Modal analysis and finite element analysis (FEA) simulation of the curved beam are used to predict, explain, and design its bistable behavior. Microscale double curved beams are fabricated by deep-reactive ion etching (DRIE) and their test results agree well with the analytic predictions. Approaches to tailor the bistable behavior of the curved beams are also presented.
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