色散(光学)
盐(化学)
胶体
丙烯酸
氮化硅
铵
水溶液
粒子(生态学)
材料科学
聚电解质
流变学
化学工程
化学
无机化学
硅
聚合物
物理化学
有机化学
复合材料
光学
共聚物
物理
海洋学
工程类
地质学
作者
Chi‐Jen Shih,Min‐Hsiung Hon
标识
DOI:10.1016/s0254-0584(98)00205-3
摘要
The stabilization of aqueous silicon nitride suspensions with ammonium salt of poly(acrylic acid) at various pH was examined systematically in order to understand the basic mechanism of dispersion. The effects of colloidal structure on particle packing was characterized by sedimentation and equivalent stokes diameter (ESD) of X-ray sedimentation technique. The rheological behavior of silicon nitride in the presence of PAA–NH4 is strongly dependent on pH and three rheological types has been defined. The electrostatic repulsion between the PAA–NH4-modified particle surface was found to be a primary mechanism governing the dispersion in both the neutral and alkaline pH range, on the other hand the steric repulsion of PAA–NH4 in acidic pH range was demonstrated to have a positive contribution to the dispersion.
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