材料科学
粒度
透射电子显微镜
衍射
散射
凝聚态物理
电子背散射衍射
电子衍射
暗场显微术
结晶学
薄膜
X射线晶体学
光学
显微镜
物理
复合材料
化学
纳米技术
作者
Andrew P. Warren,Xuan Li,V. Kamineni,Kevin R. Coffey,K. Barmak
出处
期刊:Social Science Research Network
[Social Science Electronic Publishing]
日期:2020-03-26
摘要
Grazing incidence x-ray diffraction (GID) and transmission electron microscopy (TEM) were used in a comparative investigation of nanometric Cu and W thin films. In the GID study, the in-plane grain size and microstrain present in the films were determined using established x-ray diffraction peak profile analysis. These results were compared to the TEM investigation in which hollow cone dark field (HCDF) imaging, conical dark field (CDF) imaging and precession electron diffraction (PED) were used to determine grain size. The spatial variation of crystallographic orientation within the films obtained via PED was used to determine the intragrain misorientations. For highly strained grains differences between the GID and TEM analysis are observed and are attributed to large intra-grain misorientations due to microstrain arising from lattice rotations resulting from the presence of dislocations. The combination of both characterization techniques on a common set of samples allowed for a quantitative review of Ungar's modified Williamson-Hall analysis: An additional broadening term, proportional to the product of microstrain and grain size broadening, is proposed.
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