降级(电信)
环境化学
基质(水族馆)
污染
化学
环境科学
亚硫酸盐
水处理
生化工程
计算机科学
环境工程
有机化学
海洋学
地质学
工程类
生物
电信
生态学
作者
Benjamin D. Fennell,Stephen P. Mezyk,Garrett McKay
标识
DOI:10.1021/acsenvironau.1c00042
摘要
UV-advanced reduction processes (UV-ARP) are an advanced water treatment technology characterized by the reductive transformation of chemical contaminants. Contaminant abatement in UV-ARP is most often accomplished through reaction with hydrated electrons (eaq-) produced from UV photolysis of chemical sensitizers (e.g., sulfite). In this Review, we evaluate the photochemical kinetics, substrate scope, and optimization of UV-ARP. We find that quantities typically reported in photochemical studies of natural and engineered systems are under-reported in the UV-ARP literature, especially the formation rates, scavenging capacities, and concentrations of key reactive species like eaq-. The absence of these quantities has made it difficult to fully evaluate the impact of operating conditions and the role of water matrix components on the efficiencies of UV-ARP. The UV-ARP substrate scope is weighted heavily toward contaminant classes that are resistant to degradation by advanced oxidation processes, like oxyanions and per- and polyfluoroalkyl substances. Some studies have sought to optimize the UV-ARP treatment of these contaminants; however, a thorough evaluation of the impact of water matrix components like dissolved organic matter on these optimization strategies is needed. Overall, the data compilation, analysis, and research recommendations provided in this Review will assist the UV-ARP research community in future efforts toward optimizing UV-ARP systems, modeling the eaq--based chemical transformation kinetics, and developing new UV-ARP systems.
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