A Mathematical Model for the Electrodeposition of Alloys on a Rotating Disk Electrode

A general multiple electrode reaction model for electrodeposition of alloys on a rotating disk electrode is presented. Included in the model are mass transport equations with the effect of ionic migration, Butler‐Volmer kinetic rate expressions, and the mole fractions of the individual components in the solid state. The model shows that the effect of ionic migration is important and that plating variables such as applied potential, pH, and bulk concentration can be included. Two examples (Ni‐P and Ru‐Ni‐P) are used to illustrate the predictions of the model.