电阻随机存取存储器
重置(财务)
波形
材料科学
脉搏(音乐)
基质(水族馆)
电阻式触摸屏
数据保留
光电子学
电压
硅
分析化学(期刊)
电气工程
化学
工程类
海洋学
色谱法
地质学
金融经济学
经济
作者
Dahye Kim,Jiwoong Shin,Sungjun Kim
出处
期刊:Metals
[Multidisciplinary Digital Publishing Institute]
日期:2021-10-01
卷期号:11 (10): 1572-1572
被引量:13
摘要
In this work, we conducted the following analysis of Ni/ZnO (20 nm)/n-type Si RRAM device with three different compliance currents (CCs). We compared I–V curves, including set, reset voltages, and resistance of LRS, HRS states for each CCs. For an accurate comparison of each case, statistical analysis is presented. In each case, the average value and the relative standard deviation (RSD) of resistance are calculated to analyze the characteristics of the distribution. The best variability is observed at higher CC (5 mA). In addition, we validated the non-volatile properties of the device using the retention data for each of the CCs. Based on this comparison, we proposed the most appropriate CC of the device operation. Also, a pulse was applied to measure the current waveform and demonstrate the regular operation of the device. Finally, the resistance of LRS and HRS states was measured by pulse. We statistically compared the measured pulse data with the DC data.
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