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An innovative gas inlet design in a microwave plasma chemical vapor deposition chamber for high-quality, high-speed, and high-efficiency diamond growth

材料科学 化学气相沉积 钻石 兴奋剂 制作 体积流量 基质(水族馆) 纳米技术 化学 光电子学 复合材料 热力学 有机化学 地质学 物理 医学 病理 海洋学 替代医学
作者
Weikang zhao,Yan Teng,Kun Tang,Shunming Zhu,Dongyang Liu,Kai Yang,Jingjing Duan,Yingmeng Huang,Ziang Chen,Jiandong Ye,Shulin Gu
出处
期刊:Journal of Physics D [Institute of Physics]
卷期号:56 (37): 375104-375104 被引量:6
标识
DOI:10.1088/1361-6463/acdbd6
摘要

Abstract A novel design of the gas inlet system in a diamond microwave plasma chemical vapor deposition growth chamber has been reported in this paper. The design is targeting for high-quality, high-speed, and high-efficiency diamond material fabrication. By introducing a gas inlet hole into the susceptor, we expand the ways of gas introduction for diamond growth. After extensive numerical and experimental investigation, we have found that the introduction of methane and doping gas inlet from the hole of below while the hydrogen from the top is feasible for realizing the target. The growth and doping species could be confined around the substrate, making efficient usage of the precursors. The plasma state change caused by the difference of the gas inlet modes has been ascribed to the resulted gas distribution in the chamber. The measured growth rate has been increased to 32 μ m h −1 , which is 16 times higher than traditional gas inlet configuration. Meanwhile, a large improvement of the nitrogen doping concentration has been achieved. Besides, with the increase of growth rate and nitrogen incorporation efficiency, the crystal quality and surface morphology keep in an acceptable degree. In this mode, the dual gas flow system can perfectly solve the contradiction among the crystal quality, growth rate, and doping efficiency, commonly existing during the material fabrication process, the chamber contamination could be significantly suppressed due to the constrained distribution of methyl and doping species, making the fabrication cost much lower. The results of repetitive experiments indicate that other residual impurities present in the chamber of microwave plasma chemical vapor deposition could likely regulate the threshold concentration of nitrogen required for accelerating the growth rate during the nitrogen doped diamond growth, which have a significant effect on the diamond growth.
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