介质阻挡放电
接触角
极限抗拉强度
透氧性
材料科学
壳聚糖
氩
等离子体
抗菌剂
延伸率
电介质
氧气
等离子体刻蚀
复合材料
表面粗糙度
化学工程
纳米技术
化学
蚀刻(微加工)
图层(电子)
有机化学
光电子学
工程类
物理
量子力学
作者
Marisa Kongboonkird,Piyanan Chuesiang,Victor Ryu,Ubonrat Siripatrawan
摘要
Summary This research studied the effects of argon dielectric barrier discharge (DBD) plasma on properties of chitosan film to be used as active food packaging. The effects of plasma treatment time (0, 30, 60, 90 and 120 s) on tensile strength (TS), elongation at break (EAB), colour, water vapour permeability (WVP), oxygen transmission rate (OTR), contact angle and antimicrobial activity of films were investigated. Depending on the plasma treatment time, the TS values of plasma‐treated film increased, but there were no significant differences between the EAB of control and treated films. The formation of the oxygen‐containing groups and the occurrence of etching affected the WVP, contact angle, roughness and antimicrobial activity of plasma‐treated film. Chitosan film treated with 60 s of DBD plasma had good OTR (<0.05 cc m −2 day −1 ), hydrophilicity and antimicrobial activity against various kinds of bacteria. However, it may need longer than 60 s of the treatment time to increase the WVP of the films. Overall, these results implied that plasma treatment can be used as an alternative non‐thermal approach for improving the characteristics of film packaging.
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